Process for the preparation of photostructured layers with...

Details Process for the preparation of photostructured layers with... Process for the preparation of photostructured layers with...

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G03F 5/24 (2006.01) B29C 67/00 (2006.01) G03F 7/027 (2006.01) G03F 7/028 (2006.01) G03F 7/033 (2006.01) G03F 7/038 (2006.01) G03F 7/40 (2006.01)

Patent

CA 2035779

GP-2037 PROCESS FOR THE PREPARATION OF PHOTOSTRUCTURED LAYERS WITH IMPROVED MECHANICAL PROPERTIES ABSTRACT OF THE DISCLOSURE The invention involves a process for the preparation of a photostructured layer or of three dimensional objects. Structured materials with higher mechanical stability can be prepared by the use of light-sensitive mixtures with a thermally fusible polymer/plasticizer dispersion, at least one monomer, a photoinitiator, and a thermally active compound, such mixtures being photopolymerized imagewise as well as also thermally fused and thermally polymerized.

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