C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/242.4
C07D 473/08 (2006.01)
Patent
CA 1154767
ABSTRACT OF THE DISCLOSURE The invention relates to a process for preparing a compound of the formula Image (I) and the pharmaceutically acceptable acid addition salts thereof, wherein Z1 and Z2 are each independently selected from the group consisting of CH2 and CHOB, wherein B is selected from the group consisting of hydrogen and C2 to C7-alkanoyl; Y is oxygen or sulfur; n is an integer from 0-4 but cannot be zero when Z1 is CHOB; m is an integer from 0-4 but cannot be zero when Z2 is CHOB and R1, R2 and R3 are each independently hydrogen, chlorine, bromine, iodine, hydroxy, trifluo- romethyl, C1 to C6-alkyl or C1 to C6-alkoxy, which process comprises reacting the theophylline containing segment with the phenyl containing segment in complemen- tary pathways, in which the piperazine attached to one segment displaces a leav- ing group from the other. The compounds (I) are useful in the treatment of res- piratory and allergic diseases.
369737
Beranger Serge
Favier Colette
Pascal Jean-Claude
Pinhas Henri
Fetherstonhaugh & Co.
Laroche Navarron S.a.
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