C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/266.3
C07D 401/04 (2006.01)
Patent
CA 1251212
ABSTRACT Valuable antimicrobial agents of the formula: Image wherein R1 is a hydrogen atom or a methyl group, are prepared by saponifying a compound of the formula: Image wherein R is a lower alkyl group having 1 to 3 carbon atoms and R1 is a hydrogen atom or a methyl group.
476888
Irikura Tsutomu
Matsukubo Hiroshi
Shiba Toshie
Kyorin Seiyaku Kabushiki Kaisha
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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