C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/299, 260/242
C07D 513/04 (2006.01)
Patent
CA 1117942
ABSTRACT Thiazole derivatives of general formula (I) Image (I) in which n is 1 or 2 and Ar represents a phenyl radical unsubstituted or substituted by one or more substituents selected from halogen atoms, the radical CF3, the phenyl radical straight or branched chain alkyl radicals having 1 to 4 carbon atoms,and cycloalkyl radicals having 3 to 6 carbon atoms, and their pharmaceutically acceptable acid addition salts are useful in therapy as anti- depressive agents. They are prepared by reacting the thiazole Image with a ketone X-CH2-CO-CH2O-Ar (III) (X is a leaving group, such as halogen).
345387
Kirby Eades Gale Baker
Synthelabo
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