Process for the production of a protective layer or a relief...

Details Process for the production of a protective layer or a relief... Process for the production of a protective layer or a relief...

G - Physics

03

F

96/219

G03F 7/11 (2006.01) C07F 1/10 (2006.01) C08G 59/68 (2006.01) G03F 7/038 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1287769

Process for the production of a protective layer or a relief image Abstract A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin con- taining a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appro- priate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.

473852

Affiliated with

Also associated with

Rating

Process for the production of a protective layer or a relief... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of a protective layer or a relief..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of a protective layer or a relief... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1291759