Process for the production of a thin film optical waveguide...

C - Chemistry – Metallurgy – 23 – C

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C23C 16/40 (2006.01) C23C 16/511 (2006.01) G02B 6/132 (2006.01)

Patent

CA 2082853

A process is disclosed for the production of an optical thin film waveguide of TiO2 with an attenuation of < 5 dB/cm on a planar inorganic substrate wherein the thin film waveguide is produced by a microwave plasma CVD process (PCVD).

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