C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
96/256
C25D 5/02 (2006.01) G03F 1/14 (2006.01)
Patent
CA 1261193
ABSTRACT Disclosed is a process for the production of a mask for use in X-ray lithography consisting of a frame, a carrier foil composed of metal which is clasped to the frame and is permeable to X-rays, and of masking structures which are arranged on the carrier foil and are impermeable to X-rays and which produce a desired pattern in an X-ray resist during a lithographic reproduction process. The process comprises the steps of coat- ing a metal carrier plate which, after the production of the X-ray mask, serves to form the frame, with a layer of a further metal, depositing a 1-3 µm thick metal carrier foil by vapour deposition or sputtering on to the further metal layer, applying a 10-15 µm thick polymethyl methacrylate layer to the metal carrier foil, structuring the polymethyl methacrylate layer to form a stencil corresponding to the pattern of the mask, electro- lytically depositing a nickel layer to a thickness of 1-2 µm and then a gold layer to a thickness of 8-10 µm, on the surfaces of said carrier foil exposed through said stencil, etching a window in said carrier plate down to the further metal layer, the residual part of the carrier plate forming the frame, and finally structuring the further metal layer exposed in the window in a further etching step.
466092
Buttler Wolfhart
Glashauser Walter
Aktiengesellschaft Siemens
Fetherstonhaugh & Co.
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