C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 319/06 (2006.01) C07D 207/325 (2006.01) C07D 207/333 (2006.01)
Patent
CA 2496225
A process for producing high-purity .gamma.-keto acetals in high yield by a simple and easy means, as represented by the following scheme: (I) wherein Ar is aryl; X is halogeno; Ra and Rb are each alkyl or the like; and W is alkylene.
L'invention concerne un procédé de production à haute rendement de .gamma.-céto-acétals, simple et facile à appliquer, comme il apparaît dans le schéma général (I). Dans ce schéma, Ar désigne un groupe aryle, X désigne un groupe halogéno, R?a¿ et R?b¿ désignent chacun un groupe alkyle ou analogue, et W désigne un groupe alkylène.
Kojima Shunshi
Okazaki Rei
Marks & Clerk
Sankyo Company Limited
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