Process for the rough-etching of silicon solar cells

H - Electricity – 01 – L

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Details

H01L 31/0236 (2006.01) C09K 13/06 (2006.01) C09K 13/08 (2006.01) H01L 21/306 (2006.01) H01L 21/3213 (2006.01) H01L 31/18 (2006.01)

Patent

CA 2395265

The present invention relates to a novel method for producing structured surfaces on multicrystalline, tricrystalline and monocrystalline silicon surfaces of solar cells or on silicon substrates which are used for photovoltaic purposes. The invention especially relates to an etching method and an etching means for producing a structured surface on a silicon substrate.

La présente invention concerne un nouveau procédé de réalisation de surfaces structurées sur des surfaces de silicium polycristallin, tricristallin et monocristallin de piles solaires, ou sur des substrats de silicium qui sont utilisés pour exploiter l'effet photovoltaïque. L'invention concerne en particulier un procédé d'attaque et un produit d'attaque pour la réalisation d'une surface structurée sur un substrat de silicium.

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