C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
530/5, 260/328.1
C07K 5/00 (2006.01) C07D 335/12 (2006.01) C07D 335/16 (2006.01) C07K 1/06 (2006.01)
Patent
CA 1264899
Abstract of the Disclosure A compound of the formula Image wherein x is lower alkyl, and Z is an amino acid, a peptide residue or a leaving group. Compounds in which Z is a leaving group are useful for blocking or protecting an amine compound useful in peptide synthesis and a method of protecting an amino group of an organic molecule during a reaction which modifies a portion of the molecule other than the protected amino group.
461892
Carpino Louis A.
Segev David
Carpino Louis A.
Mcfadden Fincham
Research Corporation
Segev David
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