C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
C23F 1/20 (2006.01) C23F 13/00 (2006.01) C25D 11/16 (2006.01)
Patent
CA 2098689
PROCESS FOR THE TREATMENT OF ALUMINUM BASED SUBSTRATES FOR THE PURPOSE OF ANODIC OXIDATION, BATH USED IN SAID PROCESS AND CONCENTRATE TO PREPARE THE BATH A B S T R A C T Process for the treatment of aluminum based substrates for the purpose of their anodic oxidation, comprising a surface treatment or chemical etching step using an acid bath comprising at least one fluorinated derivative of titatanium and/or of zirconium and/or of silicium as well as at least one acid of the group comprising NO3H, SO4H2 and phosphoric acid.
Droniou Patrick
Gagnepain Stephane
Pelletier Patrice
Schapira Joseph
Droniou Patrick
Fetherstonhaugh & Co.
Gagnepain Stephane
Pelletier Patrice
Schapira Joseph
LandOfFree
Process for the treatment of aluminum based substrates for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the treatment of aluminum based substrates for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the treatment of aluminum based substrates for... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1964498