Process for treating silicon and ferrosilicon with slag

C - Chemistry – Metallurgy – 01 – B

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C01B 33/02 (2006.01) C01B 33/037 (2006.01) C22C 33/00 (2006.01) C22C 38/02 (2006.01)

Patent

CA 1214315

PROCESS FOR TREATING SILICON AND FERROSILICON WITH SLAG ABSTRACT OF THE DISCLOSURE The invention relates to a process for treating elemental silicon and ferrosilicon with slag having the following analytical composition: K2O from 2 to 13 % by weight Na2O from 0 to 2 % by weight .SIGMA. K2O + Na2O from 2 to 13 % by weight SiO2 from 45 to 72 % by weight Al2O3 from 0 to 30 % by weight .SIGMA. SiO2 + Al2O3 from 60 to 78 % by weight CaO from 0 to 30 % by weight MgO from 0 to 30 % by weight .SIGMA. CaO + MgO from 15 to 30 % by weight CaF2 from 0 to 10 % by weight MgF2 from 0 to 10 % by weight .SIGMA. CaF2 + MgF2 from 0 to 10 % by weight .SIGMA. CaO + MgO + CaF2 + MgF2 from 15 to 30 % by weight and impurities resulting from the raw materials.

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