G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) B29C 59/16 (2006.01) B29C 35/08 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2058321
Abstract of the Disclosure: The process removes or partially structures the surface of a substrate of a polymer. The surface of the substrate is irradiated with an incoherent UV radiation which has a wavelength of 60 nm to 400 nm. In order to form the struc- tures, a mask is placed on the surface of the substrate. - 12 -
Esrom Hilmar
Kogelschatz Ulrich
Fetherstonhaugh & Co.
Heraeus Noblelight Gmbh
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