C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/20 (2006.01) C02F 1/58 (2006.01) C02F 9/00 (2006.01)
Patent
CA 2057362
Frankfurt, 19.12.1990 PAT/rcht-sei Hoe 90/Y024 Hoechst Aktienqesellschaft, Frankfurt am Main 80 Abstract Aqueous solutions which are contaminated by hydrogen sulfide, hydrogen cyanide and ammonia are brought to a pH of about 3 or less immediately after their formation and treated with an inert gas in a stripping column, in order to remove the impurities. The pH of the solution is then increased to about 10 or more and the solution is again treated with an inert gas in a second stripping column.
Des solutions aqueuses contaminées par du sulfure d'hydrogène, de l'acide cyanhydrique et de l'ammoniac sont amenées à un pH d'environ 3 ou moins immédiatement après leur formation, et sont traitées avec un gaz inerte dans une colonne de stripping afin d'éliminer les impuretés. Le pH de la solution est ensuite élevé jusqu'à environ 10 ou plus, et la solution est à nouveau traitée avec un gaz inerte dans une deuxième colonne de stripping.
Brunke Wolfgang
Fischer Rolf-Dieter
Gerhardus Ulrich
Leder Norbert
Muller Thomas
Celanese Gmbh
Fetherstonhaugh & Co.
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