Process furnace or the like.

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/04 (2006.01) C23C 16/46 (2006.01)

Patent

CA 2649986

A part of a CVI/CVD furnace, in which a heating system (22) for heating the furnace is located, is isolated from a remaining part of the furnace exposed to a reactive gas present therein. The shell of the furnace may for example be proided with a dividing wall (16) or the like to provide a physical separation. In addition, an inert gas such as argon or nitrogen is supplied through conduit (34) to the heating zone containing the heating system so that part of the furnace is at positive pressure differential compared to the part in which the reactive gas is present. As a result, the reactive gas is retarded from contacting the heating system which could, among other things, cause deposits to form thereon. More generally, the control of reactive gas flow in the furnace is better controlled.

Selon l'invention, une partie d'un four de dépôt/d'infiltration chimique en phase vapeur contenant un système de chauffage (22) pour chauffer le four est isolée du reste du four exposé au gaz réactif présent à l'intérieur. L'enveloppe du four peut par exemple comprendre une cloison (16) ou un élément similaire qui constitue une séparation physique. En outre, un gaz inerte tel que de l'argon ou de l'azote est envoyé grâce à une conduite (34) vers la zone de chauffage contenant le système de chauffage de sorte que la différence de pression entre cette partie du four et la partie où le gaz réactif est présent soit positive. Il en résulte que le gaz réactif ne peut entrer en contact avec le système de chauffage, ce qui pourrait entre autres causer la formation de dépôts sur ce système. Plus généralement, l'écoulement du gaz réactif dans le four est mieux contrôlé.

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