G - Physics – 05 – D
Patent
G - Physics
05
D
G05D 7/06 (2006.01) F17C 13/04 (2006.01) G05B 15/00 (2006.01) H01L 21/00 (2006.01)
Patent
CA 2050247
A plurality of gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control unit is connected to a single tool interface controller over a single communications cable. The status and operational characteristics of the individual units are communicated through the tool interface controller to a supervisory control computer by means of polling. Each flow control cabinet has its own data processor, and can be operated alone. Also, the supervisory computer can be used to operate each cabinet, as well as to monitor operations of the system. Gas demand and other signals are communicated from each tool locations to the control units through a single cable connected to the interface controller, thusreducing the original wiring cost. Changing the communications path to accompany a change of the tool to which a given conduit in one of the cabinets delivers its gas can be done quickly, in software, with a few keystrokes. Mechanical re-wiring is not needed.
Duross Ronald R.
Geist Stephen G.
Hayes Gregory L.
Sierk Dennis A.
Bereskin & Parr
Sci Systems Inc.
LandOfFree
Process gas distribution system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process gas distribution system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process gas distribution system and method will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1698210