H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/190, 345/61
H01L 31/18 (2006.01) C23C 16/455 (2006.01) C23C 16/50 (2006.01) C23C 16/54 (2006.01) C23C 16/44 (2006.01)
Patent
CA 1206244
ABSTRACT A deposition apparatus is disclosed which includes a process gas introduction and channeling system whereby process gases are directed through the deposition chamber in a direction parallel to the direction of substrate material travel and introducing dopant profiling gas into the decomposition region of the deposition chamber in a direction of flow opposite the direction of the process gases whereby a semiconductor layer is deposited across the entire surface of the substrate material.
449486
Didio Gary M.
Doehler Joachim
Hoffman Kevin R.
Laarman Timothy D.
Mcdonough Therese
Energy Conversion Devices Inc.
Gowling Lafleur Henderson Llp
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