Process monitoring system for lithography lasers

Details Process monitoring system for lithography lasers Process monitoring system for lithography lasers

G - Physics

06

F

G06F 15/00 (2006.01) G07C 3/00 (2006.01) H01S 3/00 (2006.01)

Patent

CA 2400201

A system for a monitoring lithography laser (2) at least one integrated circuit fabrication plants. Each laser (2) at each fabrication plant has associated with it a terminal server (6). With respect to each fabrication plant a central control server unit (8) is in communication with each of the lasers (2) through a local area network (7). Information from the lasers (2) is collected by the central control server unit (8) and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.

L'invention concerne un système destiné au suivi de lasers (2) de lithographie dans des ateliers de fabrication d'au moins un circuit intégré. Dans chaque atelier, un serveur (6) terminal est associé à chaque laser (2). Une unité (8) serveur de commande central est en communication, concernant chaque atelier de fabrication, avec chacun des lasers (2) via un réseau (7) local. Les informations provenant des lasers (2) est collectée par l'unité (8) serveur de commande central et ces informations sont utilisées pour fournir une information résumée rendue disponible dans un format de site web aux parties intéressées possédant une autorisation d'accès.

Affiliated with

Also associated with

Rating

Process monitoring system for lithography lasers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process monitoring system for lithography lasers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process monitoring system for lithography lasers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1506025