Process of and apparatus for forming thin films of metallic...

Details Process of and apparatus for forming thin films of metallic... Process of and apparatus for forming thin films of metallic...

C - Chemistry, Metallurgy

23

C

C23C 14/58 (2006.01) C23C 14/00 (2006.01) C23C 14/14 (2006.01) C23C 14/56 (2006.01)

Patent

CA 2166174

A process of forming films of metallic compounds on a substrate is disclosed, which essentially comprises producing a sputtered ultra-thin film and transforming this film into one of a metallic compound such as a metal oxide by exposing it to a reactive gas plasma. This operation is repeated until the resulting film product gains a desired thickness. An apparatus for carrying the process into practice is also disclosed, which comprises a sputtering electrode in a film-forming zone for producing a sputtered film of metal or metallic compound and a plasma generator in a plasma exposure zone to which the sputtered film is exposed to transform into one of a metallic compound. The two zones are respectively shielded against mutual interference.

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