Process of galvanic treatment by pulsed currents

Details Process of galvanic treatment by pulsed currents Process of galvanic treatment by pulsed currents

C - Chemistry, Metallurgy

25

D

204/4

C25D 1/10 (2006.01) C25D 1/08 (2006.01) C25D 5/18 (2006.01)

Patent

CA 2039106

ABSTRACT OF THE DISCLOSURE This invention relates to a process of galvanic treatment by deposit of nickel, alone or mixed, which is effected by reverse pulsed currents of which the rest time is less than or equal to 10 ms. The time of imposition of the cathodic current is included between 0.1 and 10 ms, the time of imposition of the anodic current is included between 0.5 and 10 ms, the cathodic peak density is between 4 and 40A/dm2, the anodic peak density is between 1 and 20A/dm2. The process makes it possible to limit the blocking of pieces comprising openings of much reduced dimen- sions, in particular less than 120 micrometres, in particular in the case of producing a rotating stencil for printing.

Affiliated with

Also associated with

Rating

Process of galvanic treatment by pulsed currents does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of galvanic treatment by pulsed currents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of galvanic treatment by pulsed currents will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1850269