Process of plasma-chemical cleaning prior to pvd or pecvd...

Details Process of plasma-chemical cleaning prior to pvd or pecvd... Process of plasma-chemical cleaning prior to pvd or pecvd...

C - Chemistry, Metallurgy

23

C

C23C 16/02 (2006.01) C23C 14/02 (2006.01) C23C 16/50 (2006.01) C23G 5/00 (2006.01)

Patent

CA 2054437

ABSTRACT The invention relates to a process for the cleaning and then coating of metal surfaces. The metal surfaces (substrates) are cleaned by a microwave-excited plasma using alternatley oxygen and hydrogen as the working gas, with at least a single alternation. Thereafter coating is performed by a physical vapour deposition processs (PVD) or a plasma enhanced chemical vapour deposition process (PECVD). The process has a universal cleaning effect, is compatible with the coating techniques and is economical to use.

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