C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/266.1, 260/2
C07D 243/08 (2006.01) C07D 295/18 (2006.01) C07D 295/192 (2006.01) C07D 403/06 (2006.01)
Patent
CA 1131630
Abstract of the Disclosure The invention relates to processes for the manufacture of novel substituted anthranilamides of the formula Image (I) in which R1 is hydrogen or an aliphatic, cycloaliphatic or cycloaliphatic-aliphatic hydrocarbon radical, R2 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoro- methyl, R3 is hydrogen or an aliphatic or substituted or unsubstituted araliphatic or heteroaryl-aliphatic hydro- carbon radical and elk and elk1 are identical or differ- ant lower alkylene radicals which separate the nitrogen atoms by 2 or 3 carbon atoms, and salts thereof, possess analgesic, anti-inflammatory and anti-allergic properties and may be used as active ingredients of analgesic, anti- inflammatory and anti-allergic pharmaceuticals. They are prepared, for example, by reacting an acid of the formula Image (III) or a reactive functional derivations thereof, with an amine of the formula Image (IV) or a reactive derivative or salt thereof.
333396
Ferrini Pier G.
Hass Georges
Rossi Alberto
Fetherstonhaugh & Co.
Novartis Ag
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