Producing substrates coated with inorganic films by plasma...

Details Producing substrates coated with inorganic films by plasma... Producing substrates coated with inorganic films by plasma...

C - Chemistry, Metallurgy

23

C

204/96.3

C23C 16/22 (2006.01) C23C 16/26 (2006.01) C23C 16/50 (2006.01) D06M 10/00 (2006.01) D06M 11/00 (2006.01)

Patent

CA 1269637

61109-7374 PRODUCING SUBSTRATES COATED WITH INORGANIC FILMS BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION ABSTRACT Radio frequency conductive substrates comprising, e.g., plates or fibers of conductive materials such as carbon and a thin, uniform firmly adherent film deposited by plasma assisted chemical vapor deposition onto the radio frequency excited substrate, and apparatus for their production. Composites comprising the coated substrates and a continuous matrix of a ceramic or an organic polymer are also disclosed.

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