Production method with thermal projection of a target

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 14/34 (2006.01) B05B 7/22 (2006.01) C22C 27/04 (2006.01) C23C 4/08 (2006.01) C23C 4/12 (2006.01) C23C 14/18 (2006.01) H05H 1/26 (2006.01)

Patent

CA 2757903

The invention relates to a method for producing a target by means of thermal projection, especially by plasma projection, said target comprising at least one compound selected from refractive metals, resistive oxides, and volatile oxides. The method is characterised in that at least a fraction of said compound in the form of a powder composition of the compound is projected by thermal projection onto at least part of the surface of the target, under a controlled atmosphere, and powerful cryogenic cooling jets directed towards the target during its construction are used.

Procédé de réalisation d'une cible par projection thermique, notamment par projection plasma, ladite cible comprenant au moins un composé choisi par les métaux réfractaires, les oxydes résistifs, les oxydes volatils caractérisé en ce qu'on projette par projection thermique sur au moins une portion de surface de la cible, au moins une fraction dudit composé sous forme d'une composition de poudre dudit composé, sous atmosphère contrôlée, et en ce qu'on utilise des jets refroidisseurs cryogéniques puissants dirigés vers la cible pendant sa construction.

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