C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/229.5
C07H 19/16 (2006.01)
Patent
CA 1102794
ABSTRACT OF THE DISCLOSURE Compounds of the formula Image wherein R is a phenyl or cyclohexyl group which may be substituted by halogen, lower alkyl or lower alkoxy, or their acid addition salts, are produced in good yield by reacting a compound of the formula Image wherein R1, R2 and R3, independently of each other, are a hydroxyl group which may be protected, which is prepared in 2 or 3 steps from 5-amino-1-.beta.-D-ribofuranosylimidazole- 4-carboxamide, with a compound of the formula R - N = C = N - R4 wherein R has the same meaning as defined above and R4 is hydrogen or the same group as R, and, if necessary, subjecting the resulting compound to a treatment for removal of protec- tive groups on its hydroxyl groups.
313340
Furukawa Yoshiyasu
Marumoto Ryuji
Shima Shunsuke
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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