C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 7/07 (2006.01) C01B 7/03 (2006.01) H01L 21/00 (2006.01)
Patent
CA 2387584
The invention relates to a novel method, which can be carried out according to industrial standards, for producing high-purity hydrochloric acid with a very low particle content, for use in the production of semiconductors.
Nouveau procédé, pouvant être mis en oeuvre à l'échelle industrielle, de préparation d'acide chlorhydrique extrêmement pur et pauvre en particules destiné à être utilisé dans la fabrication de semi-conducteurs
Buttner Werner
Hostalek Martin
Kan Ching-Jung
Lu Ching-Peng
Basf Aktiengesellschaft
Fetherstonhaugh & Co.
Merck Patent Gesellschaft Mit Beschraenkter Haftung
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