C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
400/5160, 400/92
C08K 5/01 (2006.01) C08L 23/04 (2006.01) C08L 31/04 (2006.01)
Patent
CA 1054287
ABSTRACT OF THE DISCLOSURE The present invention relates to polymers having a controlled degradation, consisting of a starting polymer which is selected from the group consisting of polyethylene, poly- propylene and ethylene-vinylacetate copolymer, said polymer being added to an olefinically unsaturated compound containing at least two double bonds, having the following general formula: Image wherein R1, R2, R3, R4, R5, R6, R7 and R8, identical or different represent a hydrogen atom, an alkyl, aryl, cycloalkyl, arylalkyl, or alkylaryl radical; at least one of them with an adjacent radical are divalent radicals which form a ring also containing unsatura- tions conjugated or not with the unsaturations already present in the olefinically unsaturated compound; A and B are divalent alkyl, aryl, cycloalkyl, arylalkyl or alkylaryl radicals, p and q are 0 or 1; n is 0, or an integer ranging from 1 to 12, n being always zero when no R radical is an aryl radical. The process for producing the new polymers which are degradable through the direct action of the sun light. The improved process eliminates, inter alia, secondary reactions leading to an accelerated photooxidation of the polymer.
190066
Marconi Walter
Mazzei Marcello
Palladino Nicola
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