Production of water-less lithographic plates

G - Physics – 03 – F

Patent

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G03F 7/075 (2006.01)

Patent

CA 2250054

There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO2, carbonyl or a direct link, X is N R4 where R4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R1, R2 and R3 are lower alkyl groups having up to six carbon atoms and R5 is a lower alkyl group having up to six carbon atoms.

L'invention concerne un précurseur de plaque lithographique sans eau qui comprend, sur une plaque d'aluminium, une composition sensible à la lumière constituée d'un polymère pourvu de groupes fonctionnels hydroxy, d'un générateur d'acide qui, exposé à la lumière, produit un acide et un silyléther de la formule générale (I), dans laquelle Rf représente un groupe fluoroaliphatique possédant de 3 à 10 atomes de carbone, Y représente oxygène, SO¿2?, carbonyle ou une liaison directe, X représente NR¿4? où R¿4? représente hydrogène ou un alkyle inférieur possédant jusqu'à 6 atomes de carbone, ou bien est une liaison directe, chacun des symboles R¿1?, R¿2? et R¿3? représente un groupe alkyle inférieur possédant jusqu'à 6 atomes de carbone et R¿5? représente un groupe alykle inférieur possédant jusqu'à 6 atomes de carbone.

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