C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 209/54 (2006.01) C07C 255/28 (2006.01) C07C 255/31 (2006.01) C07C 271/22 (2006.01)
Patent
CA 2221946
This invention is to provide a compound represented by the following formula (I) [in the formula, n is an integer of 2 to 5; R' represents a hydrogen atom or a substituent group represented by the following formula R1, in which R a, R b and R c each represents a phenyl, phenylmethyl or naphthyl group (which may be substituted with at least one substituent group selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, a halogen atom and a nitro group), a hydrogen atom, or an alkyl group having 1 to 4 carbon atoms; and R2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, with the proviso that a compound, in which n is 2, R1 is a hydrogen atom and R2 is an ethyl group, is excluded] and a compound represented by the following formula (II) useful as an antibacterial agent which is obtained by the compound of folmula (I), and also to provide a novel synthetic process for the inexpensive, short-step and industrially advantageous production thereof.
Composés de formule générale (I), dans laquelle n est un nombre entier de 2 à 5; R<1> représente H ou un substituant de formule générale (R<1>), (R<a>, R<b> et R<c> représentant chacun phényle, phénylméthyle ou naphtyle éventuellement substitués par un ou plusieurs substituants choisis dans le groupe composé d'alkyle C1-C4, alcoxy C1-C4, halogéno et nitro, H ou alkyle C1-C4); et R<2> représente H ou alkyle C1-C4 (à condition que le composé dans lequel n vaut 2, R<1> est H et R<2> éthyle soit exclus). L'invention porte également sur d'autres composés de formule générale (II) préparés à partir des composés de formule générale (I), lesquels peuvent être utilisés comme agents anti-microbiens; ainsi que sur de nouveaux procédés de préparation de ces composés à un moindre coût et en moins d'étapes.
Akiba Toshifumi
Ebata Tutomu
Hirai Keiichi
Ohta Naoki
Saito Tatsuru
Daiichi Pharmaceutical Co. Ltd.
Riches Mckenzie & Herbert Llp
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