H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 21/306 (2006.01) G03F 7/20 (2006.01) H01J 37/317 (2006.01) H01L 21/027 (2006.01)
Patent
CA 2109275
It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.
Berger Steven David
Liddle James Alexander
American Telephone And Telegraph Company
Kirby Eades Gale Baker
LandOfFree
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