Projection electron lithographic procedure

Details Projection electron lithographic procedure Projection electron lithographic procedure

H - Electricity

01

L

H01L 21/306 (2006.01) G03F 7/20 (2006.01) H01J 37/317 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2109275

It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.

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