C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/558, 260/605
C07C 211/23 (2006.01) C07C 211/43 (2006.01) C07C 211/48 (2006.01) C07C 211/50 (2006.01) C07C 211/52 (2006.01) C07C 217/46 (2006.01) C07C 317/36 (2006.01)
Patent
CA 2031398
Abstract of the disclosure The invention provides a novel class of propargyl compounds represented by the formula: Image wherein R is an C1-C20 alkyl group, C1-C20 alkylene group, C1- C20 alkylene group interrupted by -NH- group(s), C6-C7 alicyclic group and an aromatic group; R1 comprises 1-100% -CH2-C?CH group and 99-0% hydrogen atom and n is an integer of 1 to 4, and preparation thereof. These compounds are useful as coating material or sealer or rim-injection molding material.
Aoki Kei
Yamada Mitsuo
Aoki Kei
Marks & Clerk
Yamada Mitsuo
LandOfFree
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