Propenone derivatives

C - Chemistry – Metallurgy – 07 – D

Patent

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C07D 209/12 (2006.01) C07D 209/14 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 405/02 (2006.01) C07D 409/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01) C07D 471/04 (2006.01) C07D 473/00 (2006.01) C07F 7/08 (2006.01) C07F 7/10 (2006.01) C07H 15/24 (2006.01) C07H 15/26 (2006.01)

Patent

CA 2211593

Propenone derivatives represented by general formula (I) or pharmacologically acceptable salts thereof: wherein R1 represents substituted lower alkyl or YR5 (where Y represents S or O and R5 represents optionally substituted lower alkyl, optionally substituted aryl, optionally substituted aromatic heterocyclic group, or optionally substituted cyclic ether residue); R2 and R3 may be the same or different and each represents hydrogen, lower alkyl, or optionally substituted aralkyl, or R2 and R3 may be bonded to each other to thereby form optionally substituted methylene or ethylene; R4 represents hydrogen, hydroxy, lower alkyl, optionally substituted aralkyl, lower alkoxy, optionally substituted aralkyloxy, or halogeno; and X represents optionally substituted indolyl.

L'invention porte sur des dérivés du propénone de formule générale (I) ou leurs sels pharmacocompatibles dans laquelle: R?1¿ représente alkyle inférieur substitué ou YR?5¿ (où Y représente S ou O et R?5¿ représente alkyle inférieur facultativement substitué, aryle facultativement substitué, un groupe hétérocyclique aromatique facultativement substitué ou un résidu éther cyclique facultativement substitué); R?2¿ et R?3¿ peuvent être identiques ou différents et représenter chacun indépendamment H, alkyle inférieur, ou aralkyle facultativement substitué, ou R?2¿ et R?3¿ peuvent être liés l'un à l'autre pour former méthylène ou éthylène facultativement substitué; R?4¿ représente H, hydroxy, alkyle inférieur, aralkyle facultativement substitué, alkoxy inférieur, aralkyloxy facultativement substitué, ou halogéno; et X représente indolyle facultativement substitué.

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