C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 15/26 (2006.01) A61K 31/70 (2006.01) C07H 15/203 (2006.01)
Patent
CA 2189603
The present invention is directed to a propiophenone derivative of the formula [I]: Image [I] wherein R' is a lower alkanoyl group and R" is a hydrogen atom, or R' is a hydrogen atom and R" is a lower alkoxycarbonyl group, or a pharmaceutically acceptable salt thereof. These compounds have excellent hypoglycemic activity and are useful in the prophylaxis or treatment of diabetes.
Hongu Mitsuya
Matsumoto Mamoru
Oka Kozo
Saito Kunio
Tsujihara Kenji
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
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