C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 15/26 (2006.01) A61K 31/70 (2006.01) C07H 15/203 (2006.01)
Patent
CA 2225439
A propiophenone derivative of the formula (I): see Formula (I) wherein OX is a hydroxy group which may optionally be protected, Y is a lower alkyl group, and Z is a .beta.-D-glucopyranosyl group wherein one or more hydroxy groups may optionally be protected, or a pharmaceutically acceptable salt thereof. Said compounds have excellent hypoglycemic activity so that they are useful in the prophylaxis or treatment of diabetes.
Hongu Mitsuya
Matsumoto Mamoru
Oku Akira
Saito Kunio
Tsujihara Kenji
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd
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