C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
C08L 23/14 (2006.01) C08L 23/12 (2006.01) C08L 23/16 (2006.01)
Patent
CA 2118477
ABSTRACT OF THE DISCLOSURE A propylene random copolymer composition which contains a mixture of 0.05-2.7% by weight of a crystalline propylene homopolymer (A) and 97.3-99.95 by weight of a random copolymer (L) of propylene and at least one .alpha.-olefin other than propylene which copolymer has a bound propylene content of 40-85% by weight and a Mw/Mn of not more than 5.5 meets both of the two mutually conflicting requirements of further improving the transparency inherent to polypropylene sheet and film, and attaining excellent solvent resistance.-
Satoh Makoto
Setoh Ritsuo
Fetherstonhaugh & Co.
Sumitomo Chemical Co. Ltd.
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