C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/464.4, 260/4
C07F 7/18 (2006.01) C07C 43/13 (2006.01) C07C 62/08 (2006.01) C07D 239/54 (2006.01) C07D 317/70 (2006.01)
Patent
CA 1271199
ABSTRACT OF THE DISCLOSURE Protected Cyclopentanols Compounds of formula (C) Image (C) where either RD represents a hydroxymethyl group and RE represents a hydroxyl group or RD represents a protected hydroxymethyl group and RE represents a protected hydroxyl group or RE represents a hydroxyl group and RD represents an ethenyl group and R represents a hydroxyl or protected hydroxyl group or a leaving group with the proviso that either RD represents a protected hydroxymethyl group and RE represents a protected hydroxyl group or RF represents a protected hydroxyl group.
599049
Fetherstonhaugh & Co.
Glaxo Group Limited
Ravenscroft Paul
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