Protected vapor-deposited metal layers

Details Protected vapor-deposited metal layers Protected vapor-deposited metal layers

C - Chemistry, Metallurgy

23

C

96/211, 117/82

C23C 28/00 (2006.01)

Patent

CA 1197417

Abstract of the Disclosure The use of organic materials containing carbonyl groups, phenoxy groups, ester groups, polysaccharides, phthalccyanine, or alcohol groups over vapor deposited metal layers improves their mar resistance. These organic materials can improve the properties of the metal layer when used in photoresist imaging films.

421592

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