Protecting groups with increased photosensitivities

Details Protecting groups with increased photosensitivities Protecting groups with increased photosensitivities

C - Chemistry, Metallurgy

07

D

C07D 311/82 (2006.01) C07D 311/16 (2006.01) C07F 9/6564 (2006.01) C07H 19/20 (2006.01) G03C 5/00 (2006.01)

Patent

CA 2354143

Protecting groups derived from a halogenated coumarin group, a quinoline-2-one group, a xanthene group, a thioxanthene group, a selenoxanthene group, or an anthracene group are described. The protecting groups is photolabile and can be removed by irradiating the group with light, such as flash photolysis with ultraviolet radiation or pulsed infrared radiation.

La présente invention concerne des groupes protecteurs tirés des groupes suivants: groupe coumarine halogéné, groupe quinoline-2-un, groupe xanthène, groupe thioxanthème, groupe sélénoxanthène ou groupe anthracène. Les groupes protecteurs sont photolabiles et peuvent être retirés par irradiation à la lumière telle qu'une photolyse éclair par rayonnement ultraviolet ou par rayonnement infrarouge pulsé.

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