Pulsed ion beam source

Details Pulsed ion beam source Pulsed ion beam source

H - Electricity

01

J

H01J 27/00 (2006.01)

Patent

CA 2176337

An improved magnetically-confined anode plasma pulsed ion beam source (25). Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure (408) and the slow field structure (414) near the anode (410) of the ion beam source, by a gas port design (404, 406) which localizes the gas delivery into the gap between the fast coil (408) and the anode (410), by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means (180) which optimally adjusts the plasma formation position in the ion beam source.

Source améliorée (25) de faisceaux ioniques pulsés à plasma se déplaçant vers des anodes, magnétiquement confiné. Les effets de rotation des faisceaux et le rendement en puissance sont améliorés ear une conception magnétique qui place la séparatrice entre la structure (408) à flux de champ rapide et la structure (414) à champ lent près de l'anode (410) de la source de faisceaux ioniques, par une conception (404, 406) d'orifice d'entrée de gaz qui localise l'admission de gaz dans l'écart entre la bobine rapide (408) et l'anode (410), par un circuit oscillant pré-ionisant connecté à la bobine rapide, et par un dispositif (180) de champ polarisé qui ajuste de manière optimale la position de formation de plasma dans la source de faisceaux ioniques.

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