Pump for liquid or slurries using pressurized gas

F - Mech Eng,Light,Heat,Weapons – 04 – B

Patent

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137/75

F04B 41/00 (2006.01) F04F 1/06 (2006.01)

Patent

CA 2003509

A pump for liquid or slurry uses stationary sensors to detect the liquid or slurry height at an upper and at a lower predetermined level and is valve controlled to fill a pumping chamber to the upper predetermined level; valve controlled to supply gas under pressure to the top of the liquid to force it out a lower outlet port down to the lower predetermined level and to alternate such cycles with all valves being located outside the chamber.

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