Pvd - vacuum coating unit

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 14/32 (2006.01) C23C 14/50 (2006.01)

Patent

CA 2707581

A vacuum coating unit includes a reactive gas inlet (12), at least one PVD coating source (8, 21) with a laminar cathode (11) and a substrate carrier (6) containing a multiplicity of substrates (7), wherein the substrate carrier (6) forms a twodimensional horizontal extent, and this carrier is positioned between at least two PVD coating sources, and that the multiplicity of substrates (7) are cutting tools with at least one cutting edge (E) in the peripheral margin region of the laminar substrate (7), which are deposed distributed in a plane of the twodimensional extent of the substrate carrier (6), wherein the substrate carrier (6) is disposed in a horizontal plane (3) in the vacuum process chamber (1) spaced apart between the laminar cathodes (11) of the at least two PVD coating sources (8, 21) and positioned such that at least a portion of each of the at least one cutting edge (E) includes an active cutting edge (E') and this active cutting edge is oriented opposite at least one of the cathodes (11) of the PVD coating sources (8, 21) exposed at any time in the line of sight.

L'invention se rapporte à un appareil de revêtement sous vide qui contient une entrée de gaz réactif (12), au moins une source de revêtement par DPV (8, 21) avec une cathode plane (11) et un support de substrats (6) contenant plusieurs substrats (7), formant une extension horizontale bidimensionnelle et étant positionné entre au moins deux sources de revêtement par DPV. La pluralité de substrats (7) comprend des outils de coupe dotés d'au moins un bord de coupe (E), à la périphérie du substrat plan (7), les outils étant répartis dans un plan de l'extension bidimensionnelle du support de substrats (6), le support de substrats (6) étant placé à l'écart dans un plan horizontal (3) à l'intérieur de la chambre de traitement sous vide (1), entre les cathodes planes (11) des deux sources de revêtement par DPV (8, 21) ou plus, de manière à ce qu'au moins une partie d'au moins chaque bord de coupe (E) comporte un bord de coupe actif (E') et à ce que celui-ci soit orienté de manière à être exposé par contact visuel en face d'au moins l'une des cathodes (11) des sources de revêtement par DPV (8, 21).

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