Pyran derivatives

C - Chemistry – Metallurgy – 07 – H

Patent

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Details

C07H 15/04 (2006.01) C07D 309/30 (2006.01) C07H 5/02 (2006.01)

Patent

CA 2073246

2073246 9110672 PCTABS00006 The invention provides compounds of formula (I) wherein R1 represents alkyl, R2 represents an acid-labile protecting group and X1 represents a halogen atom, which are useful in the synthesis of mevalonic acid derivatives.

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