C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/231, 167/235
C07D 498/04 (2006.01) A61K 31/42 (2006.01) A61K 31/445 (2006.01)
Patent
CA 1331990
ABSTRACT OF THE DISCLOSURE A compounds of the formula Image (I) wherein A represents OH or OC(O)CH3-nXn, B represents hydrogen atom, or A and B together represent a bond; R1 represents hydrogen atom, R2 represents hydrogen atom, C(Z)CH3-nXn or C(Z)NHCH3-nXn or R1 and R2 together represents ( CH2)m, (CH2)m-1C(Z), N(R3)(CH2)2C(Z), (CH2)m-2NHC(Z) or CH2)m-2OC(Z) in which X represents fluorine atom, chlorine atom, bromine atom, a methyl group or a methoxy group and n represents 0 or an integer of 1 to 3, Z represents oxygen atom or sulfur atom, m represents an integer of 4 or 5 and R3 represents hydrogen atom or a methyl group, and pharmacological acceptable salts of the compounds which can form salts, processes therefor and pharmaceutical use of the compounds.
590141
Kamikawaji Yoshimasa
Masuda Yukinori
Matsumoto Hiroo
Nakayama Kyoko
Ohrai Kazuhiko
Gowling Lafleur Henderson Llp
Nissan Chemical Industries Ltd.
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