C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/10.2, 260/31
C07D 231/06 (2006.01) A01N 47/38 (2006.01) C07C 45/00 (2006.01) C07C 45/65 (2006.01) C07C 45/68 (2006.01) C07C 45/71 (2006.01) C07C 45/74 (2006.01) C07C 45/75 (2006.01) C07C 49/84 (2006.01) C07D 405/12 (2006.01)
Patent
CA 1171419
ABSTRACT OF THE DISCLOSURE Pyrazoline derivatives have the formula Image (I) wherein R1 represents a hydrogen atom, a lower alkyl group, phenyl group, a halogen-substituted phcnyl group, a cyano alkyl group or a lower alkoxy alkyl group; R2 and R3 respec- tively represent a hydrogen atom, a lower alkyl group, phenyl group or a halogen-substituted phenyl group; R4 represents a hydrogen atom or a lower alkyl group; X represents a hydrogen atom or a halogen atom; W represents an oxygen or sulfur atom; Y and Z respectively represent a hydrogen atom, a haloqen atom, a lower alkyl group, a lower alkoxy group, nitro group, tri- fluoromethyl group, a lower alkylthio group, an acyl group, nitrile group, a lower alkyl sufonyl group, a lower alkoxy- carbonyl group, -A-R5 or Y and Z form Image and A represents -O-, -S-, -SO- or -SO2- and R5 represents a halogen-substitu- ted lower alkyl group and are useful as insecticedes.
395923
Hatanaka Masataka
Hirose Masayoshi
Ishii Shigeru
Kudo Masaki
Nakajima Yasuyuki
Marks & Clerk
Nissan Chemical Industries Ltd.
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