C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/242.01
C07D 487/14 (2006.01) C07D 487/04 (2006.01)
Patent
CA 1122215
QA161 Abstract PYRAZOLO[1,5-c]QUINAZOLINE DERIVATIVES New compounds are provided which are useful as anti-allergics and which have the structure Image wherein R1 is carboxyl; hydroxymethyl; CO2R3 wherein R3 is lower alkyl, Li+, Na+ or K+; or Image R2 is hydrogen, lower alkyl, aryl or trifluoromethyl; and X is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl.
341087
Simpkins Ligaya M.
Vogt Berthold R.
Osler Hoskin & Harcourt Llp
Squibb (e.r.) & Sons Inc.
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