C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/47 (2006.01)
Patent
CA 2051310
A pyrazoloquinoline derivative having the formula (I): Image (I) wherein R1, R2, and R3 independently represent a hydrogen atom or a lower alkyl group; R4 represents a hydrogen atom, a lower alkyl group, a halogen-substituted lower alkyl group, or a lower alkoxycarbonyl group; the dotted line means that the pyrazole ring has two conjugated double bonds; and R4 is bonded to the nitrogen atom at the 1-position or 2-position, or pharmacologically acceptable salts thereof. These compounds exhibit excellent anti-inflammatory activity and hepatic insufficiency treating activity.
Hosoe Hisashi
Kubo Kazuhiro
Nakasato Yoshisuke
Ohmori Kenji
Suzuki Fumio
Goudreau Gage Dubuc
Kyowa Hakko Kogyo Co. Ltd.
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