C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/210, 167/223
C07D 401/12 (2006.01) A61K 31/55 (2006.01) C07D 213/56 (2006.01) C07D 213/57 (2006.01) C07D 213/61 (2006.01) C07D 213/64 (2006.01) C07D 213/643 (2006.01) C07D 213/65 (2006.01) C07D 213/70 (2006.01) C07D 213/72 (2006.01) C07D 213/80 (2006.01) C07D 213/89 (2006.01) C07D 401/14 (2006.01) C07D 491/056 (2006.01)
Patent
CA 1262726
- 1 - Abstract The invention relates to compounds of the formula: Image wherein X is alkylene or -(CR6-CR7)r- wherein R6 is H, alkyl or phenyl, R7 is H, alkyl, cyano or phenyl, and r is 1 or 2; A is alkylene or alkylene interrupted by at least one double bond; R1 is H, halogen, alkyl, alkoxy, alkylthio, cyclo- alkyloxy, cycloalkylthio, alkoxycarbonyl, carboxy, phenyl, phenoxy, phenylthio, 3-pyridyloxy or 3-pyridylthio; R2 is H, hydroxy, alkanoyloxy or alkoxycarbonyloxy, or adjacent R1 and R2 may combine to form tetramethylene or -CH2OCR8R9O- (R8 and R9 are alkyl); R3 is H, alkyl or hydroxyalkyl; R4 is H or alkyl; R5 is phenyl, heteroaryl or -(CH2)m-CHR10R11 (R10 is H or phenyl, R11 is phenyl or pyridyl and m is 0 to 2); p is 0 or 1; and q is 2 or 3; the phenyl group or moiety being optionally substituted, and salts thereof. The invention also provides processes for the preparation of the compounds, and pharmaceutical compositions contain- ing the same. The compounds and salts thereof show good antiallergic activity mainly because of their 5-lipoxy- genase inhibiting activity, antihistamine activity and/or inhibitory activity against chemical mediator release. The compounds are accordingly useful for the treatment of allergic diseases.
513710
Ishii Katsumi
Nakamura Hideo
Nishikawa Yoshinori
Shindo Tokuhiko
Uno Hitoshi
Dainippon Pharmaceutical Co. Ltd.
Ishii Katsumi
Kirby Eades Gale Baker
Nakamura Hideo
Nishikawa Yoshinori
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