C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/296.3
C07D 213/81 (2006.01)
Patent
CA 1240332
Abstract of the Disclosure The invention is concerned with novel pyridine derivatives having the general formula: Image (I) wherein R1 is a hydrogen atom or a lower alkyl group which may be substituted with hydroxy, lower alkoxy or di-lower alkylamino; R2 is a hydrogen atom, an amino group or a lower alkylamino group; and R3 is a lower alkyl group, as well as the pharmaceutically acceptable salts thereof. The derivatives of the formula (I) and their pharmaceutically acceptable salts exhibit anti- allergic effects by the two different mechanisms and hence are useful as drugs for treating allergic diseases such as asthma, pollen allergy, atopic dermatitis and the like.
509749
Mori Takashi
Ohi Nobuhiro
Ohsugi Yoshiyuki
Yamashita Yasuhiro
Chugai Seiyaku Kabushiki Kaisha
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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