C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/180, 260/244
C07D 498/06 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 215/58 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1336905
The invention is concerned with tricyclic compounds of the general formula Image (I) wherein R1 is a hydrogen atom or a carboxy-protecting radical; R2 is a hydrogen atom or a lower alkyl radical which may be substituted with a halogen atom; R3 and R4 independently are a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical or a substituted or unsubstituted amino radical; X is a halogen atom; and R5 and R6 are independently a hydrogen atom or a lower alkyl radical which may be substituted with a hydroxy radical, a lower alkoxy radical or a substituted or unsubstituted amino radical; or R5 and R6, taken together with the adjacent nitrogen atom, may form a 5 to 7 membered heterocyclic ring which may be substituted with one or more substituents at the carbon atom(s), and the hetero- cyclic ring may further contain -NR7-, -O-, -S-, -SO-, -SO2- or -NR7-CO-, [R7 is a hydrogen atom, a lower alkenyl radical, a lower alkyl or aralkyl radical which may be substituted, or a radical represented by the general formula -(CH2)nCOR8 (II) (in which n is 0 to 4 and R8 is a hydrogen atom, a lower alkoxy radical, or an amino, lower alkyl or aryl radical which may be substituted)], as well as pharmaceutically acceptable salts thereof, and hydrates or solvates of the compounds of the formula I or their salts. Also included is a process for the manufacture of these compounds, pharmaceutical preparations containing them and intermediates useful in said process. The end products have antimicrobial antivity.
546674
Aoki Masahiro
Kamata Miyako
Ohtsuka Tatsuo
Shimma Nobuo
Yokose Kazuteru
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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