C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
149/17
C09K 13/00 (2006.01) G01N 21/88 (2006.01)
Patent
CA 1109372
PYROCATECHOL-AMINE-WATER SOLUTION FOR THE DETERMINATION OF DEFECTS ABSTRACT The invention is directed to a novel method for detecting surface damage to polished silicon wafers. For very fine defects and scratches an oxidation step is used. The oxide is removed and the wafer is treated in an etch solution containing pyrocatechol, ethylene diamine and water. The defects are detectable by the naked eye.
338885
International Business Machines Corporation
Kerr Alexander
LandOfFree
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